Composition Ratio: V90W10, V70W30, V50W50, V30W70；customizable to any composition

Common Specifications: Φ≥20mm, 50–100mm, >100mm；Thickness 2–10mm；Tolerance ±0.1mm；flexible sizing, customizable

Theoretical Density & Color: ≥98%；dark gray to gray-black metallic luster，darker with higher tungsten content

Product and Company Advantages
High purity, high density, fine grain structure, low porosity, uniform sputtering, flexible sizing, customizable composition, strict quality control, fast delivery. Vanadium tungsten alloy targets are essential materials in aerospace, nuclear energy, and high-end electronics due to their ultra-high melting point, excellent radiation resistance, and high-temperature stability. By adjusting the vanadiumtungsten ratio, they can flexibly meet diverse needs ranging from lightweight protection to highdensity shielding, filling performance gaps of traditional materials in extreme environments.

We hold a definitive advantage in producing ceramic targets, refractory metal targets, and multicomponent metal targets. Through SPS (spark plasma sintering) technology, we achieve purity levels up to 5N with controllable grain structure, flexible sizing, and rapid delivery, meeting stringent requirements for scientific research, experimental studies, and highend semiconductor chip manufacturing. We also provide target material testing services, delivering results in 7–15 days to accelerate customers’ product iteration and performance validation, consistently empowering the global target material industry.

Utilizing worldleading Electron Beam (EB) melting and Vacuum Arc Remelting (VAR) processes, we achieve precise purification of highmeltingpoint metals, supporting custom development of ultralarge target ingots (single weight: 500kg–2t) with purity levels of 99.99%–99.999%.

Our inspection center is equipped with advanced testing instruments such as a Hitachi scanning electron microscope and ICP spectrometers, enabling fullprocess monitoring of over 20 indicators including material composition, grain size, and density, ensuring strict quality control.

Series Products
Metal targets, ceramic targets, binary alloy targets, ternary alloy targets, multicomponent alloy targets, highentropy alloy targets, highpurity metal evaporation materials, compound granules, highpurity target blanks, and spray powders for target applications.

Product Applications
Suitable processes: Magnetron sputtering, Arc ion plating, Electron beam evaporation

Hightemperature protection: Coatings for aircraft engine turbine blades；firstwall materials in fusion reactors

Radiation shielding: Shielding coatings for medical Xray equipment；inner linings of nuclear waste containers

Wear and corrosion resistance: Coatings for cutting tools；inner walls of chemical reactors

Functional thin films: Semiconductor diffusion barrier layers；substrate coatings for superconducting devices