Cible en alliage de vanadium et de zirconium

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Cible en alliage de vanadium et de zirconium

Description

Composition Ratio: V-10Zr, V-30Zr, V-50Zr, V-5Zr (low zirconium); customizable to any composition

Common Specifications: Φ≥20mm, 50–100mm, >100mm; Thickness 2–10mm; Tolerance ±0.1mm; flexible sizing, customizable

Theoretical Density: ≥98%

Product and Company Advantages
High purity, high density, fine grain structure, uniform composition without segregation, uniform sputtering, flexible sizing, customizable composition, strict quality control, fast delivery

We hold a definitive advantage in producing ceramic targets, refractory metal targets, and multi-component metal targets. Through SPS (spark plasma sintering) technology, we achieve purity levels up to 5N with controllable grain structure, flexible sizing, and rapid delivery, meeting stringent requirements for scientific research, experimental studies, and high-end semiconductor chip manufacturing. We also provide target material testing services, delivering results in 7–15 days to accelerate customers’ product iteration and performance validation, consistently empowering the global target material industry.

Utilizing world-leading Electron Beam (EB) melting and Vacuum Arc Remelting (VAR) processes, we achieve precise purification of high-melting-point metals, supporting custom development of ultra-large target ingots (single weight: 500kg–2t) with purity levels of 99.99%–99.999%.

Our inspection center is equipped with advanced testing instruments such as a Hitachi scanning electron microscope and ICP spectrometers, enabling full-process monitoring of over 20 indicators including material composition, grain size, and density, ensuring strict quality control.

Series Products
Metal targets, ceramic targets, binary alloy targets, multi-component alloy targets, high-entropy alloy targets, high-purity metal evaporation materials, compound granules, high-purity target blanks, and spray powders for target applications.

Product Applications
Suitable processes: Magnetron sputtering, Electron beam evaporation

Nuclear industry: Neutron absorption coatings (V-30Zr) for fast neutron reactor control rods; fuel cladding protective layers

Hydrogen energy technology: Hydrogen separation membranes (V-10Zr)

Aerospace: Bond coat layers for thermal barrier coatings in engines (V-50Zr)

Semiconductors and electronics: Diffusion barrier layers

Special functional materials: Superconducting thin film substrates