Composition Ratio: V-10Mo, V-20Mo；customizable to any composition

Common Specifications: Φ≥20mm, 50–100mm, >100mm；Thickness 2–10mm；Tolerance ±0.1mm；flexible sizing, customizable

Theoretical Density & Color: ≥98%；silver-gray metallic luster, darker gray tone with higher molybdenum content

Product and Company Advantages
High purity, high density, fine grain structure, low porosity, uniform sputtering, flexible sizing, customizable composition, strict quality control, fast delivery. Vanadium molybdenum alloy targets hold a key position in aerospace, nuclear energy, and highend manufacturing due to their core advantages of “extreme temperature resistance, multicorrosion resistance, and nuclear industry compatibility.” By combining the lightweight nature of vanadium with the hightemperature stability of molybdenum, they provide reliable solutions for ultrahightemperature and corrosioncoupled environments.

We hold a definitive advantage in producing ceramic targets, refractory metal targets, and multicomponent metal targets. Through SPS (spark plasma sintering) technology, we achieve purity levels up to 5N with controllable grain structure, flexible sizing, and rapid delivery, meeting stringent requirements for scientific research, experimental studies, and highend semiconductor chip manufacturing. We also provide target material testing services, delivering results in 7–15 days to accelerate customers’ product iteration and performance validation, consistently empowering the global target material industry.

Utilizing worldleading Electron Beam (EB) melting and Vacuum Arc Remelting (VAR) processes, we achieve precise purification of highmeltingpoint metals, supporting custom development of ultralarge target ingots (single weight: 500kg–2t) with purity levels of 99.99%–99.999%.

Our inspection center is equipped with advanced testing instruments such as a Hitachi scanning electron microscope and ICP spectrometers, enabling fullprocess monitoring of over 20 indicators including material composition, grain size, and density, ensuring strict quality control.

Series Products
Metal targets, ceramic targets, binary alloy targets, ternary alloy targets, multicomponent alloy targets, highentropy alloy targets, highpurity metal evaporation materials, compound granules, highpurity target blanks, and spray powders for target applications.

Product Applications
Suitable processes: Magnetron sputtering (DC/RF), Arc ion plating, Electron beam evaporation

Hightemperature & nuclear industry: Aircraft engines (turbine blades, combustion chamber inner wall coatings); nuclear reactors (fuel cladding coatings)

Wearresistant & corrosionresistant coatings: Cutting tools (surface coating on carbide tools with V25Mo, extending service life by 2–3 times); chemical equipment (valve and pipe inner linings)

Electronics & energy: Diffusion barrier layers (inhibiting copper diffusion in copper interconnect processes); fusion devices: protective layers for plasmafacing materials in tokamak devices