Purity: 99.95%, 99.99%

Specifications: Φ ≥ 20mm, 50-100mm,> 100mm; T: 2-10mm; Tolerance: ±0.1mm; Size flexible and customizable

Density:> 99%

Grain Size: ≤ 20μm

Product and Company Advantages

Our rhenium products achieve purity of 4N or higher, with low impurity content, clear grain boundaries, low porosity, smooth surfaces, and long service life. We supply high-purity ingots, granules, targets, and powders.

We hold a strong competitive advantage in producing ceramic targets, refractory metal targets, and multi-element metal targets. Using SPS (Spark Plasma Sintering) technology, we achieve purity up to 5N, controlled grain size, flexible dimensions, and rapid delivery to meet the stringent demands of scientific research and high-end semiconductor chip manufacturing. We also provide target material testing services, enabling fast delivery within 7-15 days to accelerate customer product iteration and performance validation, continuously empowering the global target materials industry.

Our testing center is equipped with advanced testing instruments such as a Hitachi (Japan) scanning electron microscope (50,000x magnification) and an ICP spectrometer. We implement full-process monitoring of over 20 key indicators, including material composition, grain size, and density, to ensure strict quality control.

Series Products

Planar Targets / Circular Targets

Metal Targets, Ceramic Targets, High-Entropy Alloy Targets, Binary Alloy Targets, Ternary Alloy Targets, Multi-Element Alloy Targets, High-Purity Metal Evaporation Materials, Compound Particles, Target Blanks, Spraying Powders for Targets, etc.

Product Applications

Compatible Equipment: Suitable for various magnetron sputtering systems, including single-target, multi-target, and ion sputtering systems.

Application Fields: Used in scientific experiments or research, customized products related to micro/nano fabrication and device manufacturing. Widely applied in semiconductor chips, solar photovoltaics, flat-panel displays, special coatings, and more.