Composition Ratio: Ti95V5, Ti80V20, Ti60V40；customizable to any composition

Common Specifications: Φ≥20mm, 50–100mm, >100mm; Thickness 2–10mm; Tolerance ±0.1mm; flexible sizing, customizable

Theoretical Density & Color: ≥98%; silver-gray metallic luster, darker gray with higher V content

Product and Company Advantages
High purity, high density, fine grain structure, low porosity, uniform sputtering, flexible sizing, customizable composition, strict quality control, fast delivery. Titanium vanadium alloy is the only titanium alloy that simultaneously offers superplasticity, low modulus, and high strength, making it an irreplaceable material in fields such as solid-state hydrogen storage and high-end medical devices. It is particularly suitable for advanced coating applications requiring synergistic optimization of multiple properties.

We hold a definitive advantage in producing ceramic targets, refractory metal targets, and multi-component metal targets. Through SPS (spark plasma sintering) technology, we achieve purity levels up to 5N with controllable grain structure, flexible sizing, and rapid delivery, meeting stringent requirements for scientific research, experimental studies, and high-end semiconductor chip manufacturing. We also provide target material testing services, delivering results in 7–15 days to accelerate customers’ product iteration and performance validation, consistently empowering the global target material industry.

Utilizing world-leading Electron Beam (EB) melting and Vacuum Arc Remelting (VAR) processes, we achieve precise purification of high-melting-point metals, supporting custom development of ultra-large target ingots (single weight: 500kg–2t) with purity levels of 99.99%–99.999%.

Our inspection center is equipped with advanced testing instruments such as a Hitachi scanning electron microscope and ICP spectrometers, enabling full-process monitoring of over 20 indicators including material composition, grain size, and density, ensuring strict quality control.

Series Products
Metal targets, ceramic targets, binary alloy targets, ternary alloy targets, multi-component alloy targets, high-entropy alloy targets, high-purity metal evaporation materials, compound granules, high-purity target blanks, and spray powders for target applications.

Product Applications
Suitable processes: Magnetron sputtering (DC/HiPIMS), reactive sputtering, multi-arc ion plating

Energy sector: Solid-state hydrogen storage containers, fuel cell bipolar plates

Biomedical applications: Orthopedic implants, cardiovascular stents

Tool coatings: Gear surface strengthening

Smart devices: Shape-memory thin films