Crystalline Hafnium

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Crystalline Hafnium

Description

Product Technical Parameters

Product Composition: ≥99.95%
Sphericity: ≥98%
Apparent Density: ≥10.0 g/cm³
Tap Density: ≥12.0 g/cm³
Flow Rate: ≤6.5 s/50g

Product Specifications: 5-25μm, 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm. (Customized to various particle sizes according to customer requirements)

Powder Characteristics: Manufactured using Radio Frequency (RF) Plasma Spheroidization technology. High purity, low oxygen content, high sphericity, smooth surface, free from satellite particles, uniform particle size distribution, excellent flowability, high apparent density and tap density. The company can process and produce tantalum powder, tantalum-tungsten alloy powder, high-entropy alloy powder, etc.

Compatible Processes: Laser/Electron Beam Additive Manufacturing (SLM/EBM); Laser Direct Deposition (DLD); Powder Hot Isostatic Pressing (HIP); Metal Injection Molding (MIM); Powder Metallurgy (PM); Laser Cladding (LC), etc.

Product Applications: Tantalum possesses excellent biocompatibility. Tantalum implants formed via 3D printing have an elastic modulus closest to that of human cartilage tissue, making them the most ideal orthopedic implant material, applied in the biomedical field.