Purity: ≥99.95%, 99.99%

Specifications: Customized according to requirements

Grain Size: 50μm

Product Advantages and Features

Manufactured using high-pressure sintering processes, featuring high product purity, low impurity content, fine grain size, smooth surface, and uniform sputtering surface.

Our tungsten purity can reach 4N, and we supply high-purity tungsten bars, tungsten granules, tungsten powder, spherical tungsten powder, ultrafine tungsten powder, tungsten alloy powder, etc.

Our company has been dedicated to the research, development, and production of sputtering targets and vacuum coating products for over 15 years. In 2022, our factory relocated to Hebei Province, China, featuring multiple production lines for targets and spray powders. It is equipped with high-end imported and self-developed new production equipment, along with a 1000-square-meter super laboratory. We are capable of mass production with stable supply.

Product Series

Metal targets, ceramic targets, high-entropy alloy targets, binary alloy targets, multi-component alloy targets, high-purity metal evaporation materials, fluoride particles, oxide particles, nitride particles, carbide particles, spray powder for targets, etc.

Product Applications

Primarily applied in wear-resistant coatings, and coatings for devices such as semiconductors, 3C products, and solid-state electrochromic devices.