Purity: 99.99%
Common Specifications: Square targets, round targets. Can be processed into various sizes according to customer requirements.

Product Advantages and Features

High purity, low impurity content, stable composition, fine grain size, smooth surface, uniform sputtering surface.

Our company independently develops new production equipment for high-purity targets, employing SPS sintering technology and vacuum smelting technology. Currently in mass production with short lead times, we are continuously expanding our scale. The high-purity cobalt targets we produce hold a significant market share and have a stable customer base.

Series Products

High-purity cobalt ingots, high-purity cobalt rods, Jinchuan cobalt plates, electrolytic cobalt, cobalt targets, cobalt sheets, cobalt strips, cobalt foil, cobalt wire, cobalt pellets, cobalt granules, cobalt powder, cobalt alloy powder, spherical cobalt powder, etc.

Product Applications

Semiconductor Manufacturing: Used in processes like sputter coating during chip manufacturing. For example, in the 4nm process of the NVIDIA AI chip GB200 manufactured by TSMC, 12-inch high-purity cobalt targets might be used for wiring between transistors.
Thin Film Deposition: Deposits cobalt thin films on various substrates through techniques like Physical Vapor Deposition (PVD) to impart specific properties such as wear resistance, corrosion resistance, conductivity, and magnetism.
Research Field: Used in research areas like materials science.