Composition Ratio: V-20Cr, V-50Cr；Customizable to any composition

Common Specifications: Φ≥20mm, 50–100mm, >100mm；Thickness 2–10mm；Tolerance ±0.1mm；Flexible sizing, customizable

Theoretical Density & Color: ≥98%；Silver-gray metallic luster, darker tone when chromium content is higher

Product and Company Advantages
High purity, high density, fine grain structure, low porosity, uniform sputtering, flexible sizing, customizable composition, strict quality control, fast delivery. Vanadium chromium alloy targets hold a significant position in aerospace, nuclear energy, and precision manufacturing due to their core properties: “high-temperature resistance, corrosion resistance, and high hardness.” They balance the lightweight nature of vanadium with chromium’s oxidation resistance, making them especially suitable for high-temperature and corrosive environments. They also show great potential in new energy equipment (e.g., molten salt reactors) and semiconductor packaging.

We hold a definitive advantage in producing ceramic targets, refractory metal targets, and multi-component metal targets. Through SPS (spark plasma sintering) technology, we achieve purity levels up to 5N with controllable grain structure, flexible sizing, and rapid delivery, meeting stringent requirements for scientific research, experimental studies, and high-end semiconductor chip manufacturing. We also provide target material testing services, delivering results in 7–15 days to accelerate customers’ product iteration and performance validation, consistently empowering the global target material industry.

Utilizing world-leading Electron Beam (EB) melting and Vacuum Arc Remelting (VAR) processes, we achieve precise purification of high-melting-point metals, supporting custom development of ultra-large target ingots (single weight: 500kg–2t) with purity levels of 99.99%–99.999%.

Our inspection center is equipped with advanced testing instruments such as a Hitachi scanning electron microscope and ICP spectrometers, enabling full-process monitoring of over 20 indicators including material composition, grain size, and density, ensuring strict quality control.

Series Products
Metal targets, ceramic targets, binary alloy targets, ternary alloy targets, multi-component alloy targets, high-entropy alloy targets, high-purity metal evaporation materials, compound granules, high-purity target blanks, and spray powders for target applications.

Product Applications
Suitable processes: Magnetron sputtering (DC/RF), Electron beam evaporation, Arc ion plating

High-temperature protective coatings: Aircraft engines (turbine blades, combustion chamber inner wall coatings); Nuclear reactors (fuel cladding coatings)

Corrosion-resistant coatings: Chemical equipment (reactor vessels, valve linings); Marine engineering (anti-corrosion coatings for ship components)

Wear-resistant coatings: Cutting tools (coating on carbide drill bits with V-30Cr, extending service life by 2–3 times); Mechanical bearings (coatings for high-load components)

Functional thin films: Semiconductor diffusion barrier layers (inhibiting atomic migration in copper interconnects)