Purity: Zr+Hf ≥ 99.9%, 99.95%, 99.99%
Specifications: Φ ≥ 20mm, 50-100mm,> 100mm; T: 2-10mm; Tolerance: ±0.1mm; Size flexible and customizable.
Grain Size: ≤ 45μm
Product and Company Advantages
Manufactured using vacuum melting and SPS (Spark Plasma Sintering) processes, ensuring high purity (zirconium content less than 0.5%, can reach as low as 0.2%). GDMS reports are provided as support. The product features high density, fine grain structure, and a uniform sputtering surface.
Our products offer flexible dimensions and rapid delivery, meeting the stringent requirements of scientific research experiments and high-end semiconductor chip manufacturing. We also provide target material testing services, achieving fast delivery within 7-15 days to accelerate customer product iteration and performance validation, continuously empowering the global target materials industry.
Our testing center is equipped with advanced testing instruments such as a Hitachi (Japan) scanning electron microscope (50,000x magnification) and an ICP spectrometer. We implement full-process monitoring of over 20 key indicators, including material composition, grain size, and density, to ensure strict quality control.
Series Products
Our company has consistently focused on the R&D and production of hafnium series products. Our sales volume accounts for approximately one-third of the national total. We provide raw materials and custom processing services for numerous enterprises. Our product line mainly includes: Crystalline Hafnium, High-Purity Hafnium Ingot, Hafnium Bar, Hafnium Plate, Hafnium Strip, Hafnium Sheet, Hafnium Wire, Hafnium Granules, Hafnium Target, Hafnium Alloy, Hafnium Powder, etc.
Additionally: Metal Targets, Ceramic Targets, High-Entropy Alloy Targets, Multi-Component Alloy Targets, High-Purity Metal Evaporation Materials, Fluoride Particles, Oxide Particles, Nitride Particles, Carbide Particles, Spraying Powders for Targets, Target Blanks, etc.
Product Applications
Semiconductor Field: Hafnium targets are used in Electron Beam Physical Vapor Deposition (EBPVD) and Physical Vapor Deposition (PVD) processes for manufacturing components like electrodes and transistors in electronic devices. Advantages include high-temperature resistance, strong corrosion resistance, pure film quality, and stable performance under high-temperature conditions.
Optoelectronics Field: Hafnium targets are used to produce optical thin films, such as mirrors and lenses. They offer uniform film thickness and excellent optical properties.
Aerospace Field: Hafnium targets are used in manufacturing engine components to improve surface hardness and service life. They are also used in producing superalloys and turbine blades, among other applications.